Ranging from the basic principles to the forefront of microlithography, this unique volume explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing.
The three authors, two affiliated with Hitachi, Ltd. and all members of the Chemical Society of Japan, expound upon the basic principles and innovations in the science and applications of microlithography: the fabrication etching technology essential to the manufacture of patterns in metals, insulators, and semiconductor devices (diodes, transistors, and integrated circuits). They discuss the field's brief history; practical, chemical, and theoretical aspects of various types of lithographic processes; optical exposure tools and optical pattern transfer; and resolution limits and trends. ZEP, a polymer used as an electron beam resist, is the final index entry. Supporting mathematics are appended. Annotation c. by Book News, Inc., Portland, Or.
"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
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