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Microwave Induced Plasma Analytical Spectrometry [Kietas viršelis]

Series edited by (Deakin University), (Warsaw University of Technology, Poland), (Ertec, Poland)
  • Formatas: Hardback, 264 pages, aukštis x plotis: 234x156 mm, weight: 1209 g, No
  • Serija: RSC Analytical Spectroscopy Series Volume 12
  • Išleidimo metai: 24-Nov-2010
  • Leidėjas: Royal Society of Chemistry
  • ISBN-10: 1849730520
  • ISBN-13: 9781849730525
Kitos knygos pagal šią temą:
Microwave Induced Plasma Analytical SpectrometryDidesnis paveikslėlis
  • Formatas: Hardback, 264 pages, aukštis x plotis: 234x156 mm, weight: 1209 g, No
  • Serija: RSC Analytical Spectroscopy Series Volume 12
  • Išleidimo metai: 24-Nov-2010
  • Leidėjas: Royal Society of Chemistry
  • ISBN-10: 1849730520
  • ISBN-13: 9781849730525
Kitos knygos pagal šią temą:
Pastovi nuoroda: https://www.kriso.lt/db/9781849730525.html
Raktažodžiai:
This book is the most comprehensive publication on MWP technology and MWP-OES analytical spectrometry with an emphasis on practical issues.


This book is the most comprehensive recent publication on MIPs, consisting of 13 chapters, primarily involving the fundamentals, the instrumentation, and the methodologies of MIP-OES. The physical and chemical characteristics of the various MIP sources and sample introduction techniques available are all discussed as well as how these characteristics affect the design of the parts of the MIP setup with inclusion of some very recent work with MIP sources. Considerable experimental and fundamental emphasis is placed on the plasma generation as well as the experimental aspects of sample introduction in MIP spectrometry. The book firstly outlines the generation and operation of MIP discharges, and presents briefly the principles of MIP-based techniques currently in use, along with their potential benefits and limitations. It then addresses the art and science of microwave plasma generation and highlights very recent advances in the field, presenting both the fundamental properties and the design details of new microwave plasma sources. Analytical characteristics and novel applications of MIP-OES for a wide variety of sample types are also reviewed. As the book documents the latest achievements in MIP spectrometry, it should stimulate their use on a wider scale in the analytical and research laboratories and will prove useful to manufacturers of analytical instruments. This book is also aimed at academics and postgraduates embarking on work in the field of MIP source spectrometry, ICP/MIP users, analysts and research groups who want to configure their own plasma spectrometry setup, and manufacturers of plasma spectrometers and MIP devices. It will also be a useful source of information for those seeking to interface various sample introduction techniques with plasmas and for all those who would like to know more about the technique.
Chapter 1 An Introduction to Microwave Plasma Spectrometries
1(22)
1.1 Introduction
1(4)
1.1.1 Historical Background
2(2)
1.1.2 The Present Status of Microwave Plasma Spectrometry
4(1)
1.2 Energy Flow between Microwave Plasma and Analyte
5(4)
1.2.1 Microwave Power Absorption by the Plasma
5(1)
1.2.2 Plasma-Sample Interaction
6(1)
1.2.3 Analyte Excitation and Ionization
7(1)
1.2.4 Summary: Energy Flow Diagram
8(1)
1.3 Microwave Plasma Generation
9(6)
1.3.1 Microwave Plasma Geometries (Configurations)
12(1)
1.3.2 Power Density versus Plasma Stability
13(2)
1.4 Basic Physical Characteristics of a Microwave Plasma Discharge
15(2)
1.5 Spectroscopic Techniques Employing Microwave Induced Plasmas
17(1)
References
18(5)
Chapter 2 Instrumentation for Microwave Induced Plasma Optical Emission Spectrometry
23(14)
2.1 The Components of a Microwave Induced Plasma Optical Emission Spectrometry System
23(3)
2.2 Microwave Induced Plasma Torches
26(4)
2.2.1 Torch Designs
27(3)
2.2.2 The Importance of Vertical Positioning of a Microwave Induced Plasma Torch
30(1)
2.3 Pros and Cons of the Microwave Induced Plasma Technique
30(4)
References
34(3)
Chapter 3 Principles of Operation and Construction of Microwave Plasma Cavities
37(57)
3.1 E- and H-type Discharges at Different Gas Pressures and Frequencies
37(2)
3.1.1 Choice of Operating Frequency
39(1)
3.2 Some Basic Knowledge about Microwave Transmission Lines and Resonant Cavities
39(8)
3.2.1 Requirements for an Ideal Microwave Cavity
44(1)
3.2.2 What Makes a Good Microwave Plasma?
45(1)
3.2.3 Sample Introduction into a Microwave Plasma
46(1)
3.3 General Classification of Possible Microwave Plasma Sources
47(32)
3.3.1 E-type Microwave Plasma Sources
47(24)
3.3.2 H-type Microwave Plasma Sources
71(6)
3.3.3 Hybrid EH-types of Microwave Plasma Sources
77(2)
3.4 Making Annular-shaped Microwave Plasmas
79(4)
3.4.1 Introducing the Symmetry of Microwave Energy Coupling and Making a Doughnut-shaped Plasma
79(2)
3.4.2 Plasma-to-doughnut Shape Approaches
81(1)
3.4.3 Making the Annular-shaped Microwave Plasma
81(2)
3.5 The Concept of Microwave Cavities with Rotating Microwave Fields
83(6)
3.5.1 Comments on Plasma Contamination in the New Capacitive Microwave Plasma Systems
87(2)
3.6 Final Remarks: Thinking of the Future
89(1)
References
90(4)
Chapter 4 Microwave Safety
94(4)
4.1 Introduction
94(1)
4.2 Microwave Frequencies Permitted to be Used in Analytical Instrumentation
94(1)
4.3 Working with Microwave Plasmas
95(1)
4.4 General Rules and Methods
96(1)
References
97(1)
Chapter 5 Optical Emission Spectrometry with Microwave Plasmas
98(23)
5.1 Origins of Atomic Spectra
98(3)
5.2 Basic Spectroscopy Practice
101(2)
5.2.1 Spectral Line Intensity
101(1)
5.2.2 Background Correction
101(1)
5.2.3 Transient Signal Measurement
102(1)
5.3 Instrumentation
103(5)
5.3.1 Spectrometer Configurations
103(1)
5.3.2 The Use of Echelle Optics to Observe the Emission from Microwave Plasmas
104(1)
5.3.3 Interference Filters
105(1)
5.3.4 Instruments Based on Fibre Optics
106(1)
5.3.5 Detection Systems
106(2)
5.4 The Microwave Induced Plasma Spectrum: General Description
108(3)
5.5 Provisional Wavelength Tables Specific for Microwave Induced Plasma Spectra
111(7)
References
118(3)
Chapter 6 Introduction of Gases and Vapours into Microwave Plasmas
121(20)
6.1 Introduction
121(3)
6.2 Continuous Gas Introduction
124(1)
6.3 Hydride Generation and Related Techniques
125(2)
6.4 Generation of Other Gaseous Species
127(1)
6.5 Microwave Induced Plasma Coupling with Gas Chromatographic Techniques
128(5)
6.5.1 Atomic Emission Detector
130(3)
6.6 Solid-phase Microextraction
133(1)
6.7 Quantitative Analysis of Gases
134(1)
References
135(6)
Chapter 7 Solution and Slurry Nebulization Coupling with Microwave Plasmas
141(21)
7.1 Nebulization Techniques Compatible with Microwave Plasmas
141(1)
7.2 Plasma Tolerance to Solvent Loading
142(2)
7.3 Nebulizer Designs
144(7)
7.3.1 Pneumatic Nebulizers
144(2)
7.3.2 Ultrasonic Nebulizers
146(2)
7.3.3 Spray Chambers and Desolvation Systems
148(3)
7.3.4 Flow Injection Analysis
151(1)
7.4 Nebulization Methods Appropriate for Different Sample Classes
151(3)
7.5 Microsampling Techniques for Liquids
154(1)
7.6 Dual-flow Nebulization Techniques
155(1)
7.7 Slurry Nebulization
156(1)
7.8 Separation/Preconcentration Techniques and Solution Nebulization
157(1)
References
158(4)
Chapter 8 Solid Sampling Techniques for Microwave Plasmas
162(16)
8.1 Introduction
162(1)
8.2 Methods that Convert Solid Samples into an Aerosol or Vapour
163(4)
8.2.1 Spark and Arc Ablation
163(1)
8.2.2 Laser Ablation
164(1)
8.2.3 Electrothermal Vaporization
165(2)
8.3 Discrete Powder Introduction
167(1)
8.4 Continuous Powder Introduction
168(3)
8.5 Separation Methods Coupled to Continuous Powder Introduction
171(1)
8.6 Analysis of Powdered Samples by CPI-MWP-OES
172(3)
References
175(3)
Chapter 9 Optimization of the MWP-OES System
178(11)
9.1 What do we Optimize?
178(2)
9.1.1 Sample Introduction System-related Parameters
178(1)
9.1.2 Source-related Parameters
179(1)
9.1.3 Spectrometer-related Parameters
180(1)
9.2 Sequence for Optimizing the Parameters
180(2)
9.3 Relation between Analytical Signal and Aerosol (Sample) Parameters
182(1)
9.4 Optimizing Plasma Parameters for Trace Analysis
183(2)
9.5 Instrument Tests
185(1)
References
186(3)
Chapter 10 Analytical Performance of MWP-OES
189(14)
10.1 Introduction
189(1)
10.2 Interferences in MWP-OES
190(3)
10.2.1 Non-spectral Interferences in Microwave Plasmas
191(2)
10.3 Calibration Strategies
193(2)
10.4 General Analytical Characteristics of MWP-OES
195(1)
10.5 Comparison of Different MWP-based Techniques
196(1)
10.6 Microwave Plasmas versus Other Plasma Sources
197(2)
References
199(4)
Chapter 11 Analytical Applications of MWP-OES
203(19)
11.1 Microwave Plasma Spectroscopic Techniques: Overview of Practical Uses
203(4)
11.1.1 Types of Analyses
205(2)
11.2 Selected Applications of MWP-OES in Environmental Analysis
207(1)
11.3 Selected Applications of MWP-OES in Clinical Analysis
208(1)
11.4 Selected Applications of MWP-OES in Industrial Analysis
209(3)
11.5 Selected Applications of MWP-OES in Geological Analysis
212(1)
11.6 Selected Applications of MIP-OES in Speciation Studies
212(1)
References
213(9)
Chapter 12 Non-emission Microwave Plasma Spectroscopic Techniques and Tandem Sources
222(16)
12.1 Microwave Plasma Atomic Absorption Spectrometry
222(3)
12.1.1 Instrumental Setup
222(3)
12.2 Microwave Plasma Atomic Fluorescence Spectrometry
225(2)
12.3 Microwave Plasma Mass Spectrometry
227(3)
12.4 Microwave Plasma Cavity Ringdown Spectroscopy
230(1)
12.5 Tandem Sources and Miscellaneous
231(1)
References
232(6)
Chapter 13 The Future for Microwave Plasma Spectrometry
238(2)
Appendix 240(3)
Subject Index 243
Krzysztof Jankowski is Associate Professor in the Department of Analytical Chemistry at the University of Warsaw, Poland. He received his MSc and PhD from the Warsaw University of Technology and was awarded his DSc by the Minister of Science and Higher Education for his thesis entitled "Microwave induced plasma as an excitation source for spectrochemical analysis. Characterization and application" in 2003. Prior to that, he was a Senior Scientist in Analab Ltd., a manufacturer of MIP-OES instruments, and subsequently a manager of 3 research projects concerning analytical applications of microwave induced plasma. He was also manager of the research & development project granted by the Ministry of Science and Higher Education in 2007-2008 entitled: "Stable helium MIP as an excitation source for optical emission spectrometry and an ionization source for mass spectrometry". His scientific interests include: microwave plasma sources for spectrochemistry; sample introduction techniques for plasma spectrometry; plasma diagnostics; analytical applications of plasma spectrometric techniques and process analytical chemistry. He has also had 1 book published, and over 30 papers, most of which are related to microwave induced plasma developments, over 70 lectures and conference contributions, and 10 patents on microwave plasma sources, sample introduction devices, analytical procedures and chemical synthesis. Edward Reszke is owner of Ertec-Poland - a Polish microwave Hi-Tech company www.ertec.pl. After studying at the Department of Electronics in Wroclaw Technical University, he became a researcher in chemistry (microwave plasma cavities) at the University of Massachusetts, a researcher in plasma chemistry and technology (plasma equipment optimization) at the Universite de Sherbrooke (Quebec,Canada) and then Visiting Professor at Eigenossische Technische Hochschule and Universitat in Zurich. He was the chief designer of the first Polish microwave equipment for analytical chemistry, pharmacy and medicine and co-creator of the highly ranked position of Poland in the field of applications of microwave energy in analytical chemistry, chemical synthesis of organic and inorganic compounds and medicine. He is a well recognized expert in the field of microwave equipment including microwave plasma cavities and constructor and manufacturer of microwave plasma sources used by researchers. He is also the author and co-author of over 100 technical publications, including more than 45 patent applications in different branches of electronic engineering, microwave power, microwave powered chemical reactors and plasma devices. In 2008 three patent disclosures related to microwave plasma cavities were registered in the Patent Office.