Advances in Imaging & Electron Physics merges two long-running serials--Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
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Praise for the Series"Editing by P.W. Hawkes is immaculate and the production, in the usual style of Advances in Electronics & Electron Physics, results in a volume that will be a handsome addition to any bookshelf."--MRS BULLETIN"With the accelerating pace of research and development in so many areas of microscopy, keeping abreast of the widespread literature is becoming increasingly time-consuming. In Advances in Optical & Electron Microscopy the Editors are to be congratulated on bringing together in a convenient and comprehensible form a variety of topics of current interest."--J.A. Chapman in LABORATORY PRACTICE
CONTRIBUTORS vii(2) PREFACE ix Near-Sensor Image Processing 2(76) ANDERS ASTROM ROBERT FORCHHEIMER I. Introduction 2(4) II. A Near-Sensor Image Processor 6(6) III. Near-Sensor Image Processing Algorithms 12(10) IV. Adaptive Thresholding 22(3) V. Variable Sampling Time 25(8) VI. Grayscale Morphology 33(5) VII. Linear Convolution 38(4) VIII. A 2D NSIP Model 42(5) IX. Global Operations 47(10) X. Feature Extraction 57(6) XI. An NSIP System 63(8) XII. Sheet-of-Light Range Images 71(4) XIII. Conclusion 75(1) Acknowledgement 76(1) References 76(2) Digital Image Processing Technology for Scanning Electron Microscopy 78(64) EISAKU OHO I. Introduction 78(1) II. Proper Acquisition and Handling of SEM Image 79(11) III. Quality Improvement of SEM Images 90(24) IV. Image Measurement and Analysis 114(2) V. SEM Parameters Measurement 116(10) VI. Color SEM Image 126(6) VII. Automatic Focusing and Astigmatism Correction 132(1) VIII. Remote Control of SEM 133(2) IX. Active Image Processing 135(2) References 137(5) Design and Performance of Shadow-Mask Color Cathode Ray Tubes 142(125) E. YAMAZAKI I. Introduction 142(1) II. Basic Structure of Shadow-Mask Tube and Principle of Operation 143(3) III. Alternative Gun and Screen Arrangements 146(13) IV. Geometric Considerations 159(12) V. Shadow Masks 171(10) VI. Phosphor Materials and Screen Fabrication 181(24) VII. Deflection 205(11) VIII. Glass Bulbs 216(7) IX. Reduction of Screen Curvature and Use of Flat Tension Masks 223(6) X. Contrast Enhancement 229(13) XI. Moire 242(3) XII. Shadow-Mask Tubes for High-Resolution Display Applications 245(4) XIII. Human Factors and Health Considerations 249(4) XIV. Concluding Remarks 253(2) Acknowledgment 255(1) Appendix: Some Specifications of Representative Tube Types 255(7) References 262(5) Electron Gun Systems for Color Cathode Ray Tubes 267(138) HIROSHI SUZUKI I. Historical Introduction 267(5) II. Electron Beam Formation and Factors Limiting Current Density of Spot 272(43) III. Electron Gun Designs 315(48) IV. Cathodes 363(20) V. Techniques for Improving High-Tension Stability 383(10) Acknowledgment 393(1) References 393(12) INDEX 405
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
