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Principles of Electron Optics, Volume 2: Applied Geometrical Optics 2nd edition [Minkštas viršelis]

(Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France), (Instit)
  • Formatas: Paperback / softback, 766 pages, aukštis x plotis: 235x191 mm, weight: 20 g
  • Išleidimo metai: 13-Dec-2017
  • Leidėjas: Academic Press Inc
  • ISBN-10: 0128133694
  • ISBN-13: 9780128133699
Kitos knygos pagal šią temą:
Principles of Electron Optics, Volume 2: Applied Geometrical Optics 2nd editionDidesnis paveikslėlis
  • Formatas: Paperback / softback, 766 pages, aukštis x plotis: 235x191 mm, weight: 20 g
  • Išleidimo metai: 13-Dec-2017
  • Leidėjas: Academic Press Inc
  • ISBN-10: 0128133694
  • ISBN-13: 9780128133699
Kitos knygos pagal šią temą:
Pastovi nuoroda: https://www.kriso.lt/db/9780128133699.html
Raktažodžiai:

Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems.

The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text.

The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.

  • Offers a fully revised and expanded new edition based on the latest research developments in electron optics
  • Written by the top experts in the field
  • Covers every significant advance in electron optics since the subject originated
  • Contains exceptionally complete and carefully selected references and notes
  • Serves both as a reference and text

Daugiau informacijos

Fully revised and updated reference providing the applications of electron optics in geometrical optics
Preface to the Second Edition xiii
Preface to the First Edition (Extracts) xv
Acknowledgments xvii
Part VII Instrumental Optics
709(248)
Chapter 35 Electrostatic Lenses
711(60)
35.1 Introduction
711(2)
35.2 Immersion Lenses
713(23)
35.2.1 The Single Aperture
713(3)
35.2.2 The Two-Electrode Lens
716(14)
35.2.3 Three or More Electrodes
730(6)
35.3 Einzel Lenses
736(26)
35.3.1 The Principal Potential Models
737(17)
35.3.2 Measurements and Exact Calculations
754(8)
35.3.3 Miniature Lenses
762(1)
35.4 Grid or Foil Lenses
762(4)
35.5 Conical Lenses and Coaxial Lenses
766(2)
35.6 Cylindrical Lenses
768(3)
Chapter 36 Magnetic Lenses
771(110)
36.1 Introduction
771(7)
36.1.1 Modes of Operation
774(1)
36.1.2 Practical Design
775(3)
36.1.3 Notation
778(1)
36.2 Field Models
778(13)
36.2.1 Symmetric Lenses: Glaser's Bell-Shaped Model
779(12)
36.3 Related Bell-Shaped Curves
791(21)
36.3.1 The Grivet--Lenz Model
792(1)
36.3.2 The Exponential Model
793(1)
36.3.3 The Power Law Model
794(2)
36.3.4 The Convolutional Models
796(2)
36.3.5 A Generalized Model
798(5)
36.3.6 Unsymmetric Lenses
803(3)
36.3.7 Hahn's Procedure
806(5)
36.3.8 Other Models
811(1)
36.4 Measurements and Universal Curves
812(21)
36.4.1 Introduction
812(1)
36.4.2 Unsaturated Lenses
812(6)
36.4.3 Saturated Lenses
818(15)
36.5 Ultimate Lens Performance
833(17)
36.5.1 Tretner's Analysis
833(7)
36.5.2 Earlier Studies
840(4)
36.5.3 Optimization
844(6)
36.6 Lenses of Unusual Geometry
850(5)
36.6.1 Mini-Lenses, Pancake Lenses and Single-Polepiece Lenses
850(3)
36.6.2 Laminated Lenses
853(2)
36.7 Special Purpose Lenses
855(26)
36.7.1 Unsymmetrical Round Lenses
855(3)
36.7.2 Superconducting Shielding Lenses or Cryolenses
858(5)
36.7.3 Permanent-Magnet Lenses
863(4)
36.7.4 Triple-Polepiece Projector Lenses
867(1)
36.7.5 Objective Lens with Low Magnetic Field at the Specimen Capable of Good Resolution
868(5)
36.7.6 Probe-Forming Lenses for Low-Voltage Scanning Electron Microscopes
873(3)
36.7.7 Hybrid TEM--STEM Operation: the Twin and Super-Twin Geometries
876(2)
36.7.8 The Lotus-Root Multibeam Lens
878(3)
Chapter 37 Electron Mirrors, Low-Energy-Electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-Emission Microscopy
881(10)
37.1 The Electron Mirror Microscope
881(1)
37.2 Mirrors in Energy Analysis
882(2)
37.3 Cathode Lenses, Low-Energy-Electron Microscopes and Photoemission Electron Microscopes
884(3)
37.4 Field-Emission Microscopy
887(1)
37.5 Ultrafast Electron Microscopy
887(4)
Chapter 38 The Wien Filter
891(16)
Chapter 39 Quadrupole Lenses
907(18)
39.1 Introduction
907(1)
39.2 The Rectangular and Bell-Shaped Models
908(3)
39.3 Isolated Quadrupoles and Doublets
911(4)
39.4 Triplets
915(1)
39.5 Quadruplets
915(1)
39.6 Other Quadrupole Geometries
916(9)
39.6.1 Arc Lenses
916(1)
39.6.2 Crossed Lenses
916(2)
39.6.3 Biplanar Lenses
918(3)
39.6.4 Astigmatic Tube Lenses
921(1)
39.6.5 Transaxial Lenses
922(1)
39.6.6 Radial Lenses
923(2)
Chapter 40 Deflection Systems
925(32)
40.1 Introduction
925(4)
40.2 Field Models for Magnetic Deflection Systems
929(11)
40.2.1 Field of a Closed Loop in Free Space
931(2)
40.2.2 Approximate Treatment of Ferrite Shields
933(5)
40.2.3 The Axial Harmonics
938(2)
40.3 The Variable-Axis Lens
940(7)
40.3.1 Theoretical Considerations
941(4)
40.3.2 Practical Design
945(2)
40.4 Alternative Concepts
947(4)
40.5 Deflection Modes and Beam-Shaping Techniques
951(6)
Part VIII Aberration Correction and Beam Intensity Distribution (Caustics)
957(92)
Chapter 41 Aberration Correction
959(66)
41.1 Introduction
959(1)
41.2 Multipole Correctors
960(36)
41.2.1 Quadrupoles and Octopoles
960(17)
41.2.2 Sextupole Optics and Sextupole Correctors
977(12)
41.2.3 Practical Designs
989(2)
41.2.4 Measurement of Aberrations
991(5)
41.3 Foil Lenses and Space Charge
996(9)
41.3.1 Space Charge Clouds
996(2)
41.3.2 Foil Lenses
998(7)
41.4 Axial Conductors
1005(1)
41.5 Mirrors
1006(6)
41.6 High-Frequency Lenses
1012(9)
41.6.1 Spherical Correction
1012(7)
41.6.2 Chromatic Correction
1019(2)
41.7 Other Aspects of Aberration Correction
1021(2)
41.8 Concluding Remarks
1023(2)
Chapter 42 Caustics and Their Uses
1025(24)
42.1 Introduction
1025(1)
42.2 The Concept of the Caustic
1025(2)
42.3 The Caustic of a Round Lens
1027(4)
42.4 The Caustic of an Astigmatic Lens
1031(3)
42.5 Intensity Considerations
1034(4)
42.6 Higher Order Focusing Properties
1038(5)
42.7 Applications of Annular Systems
1043(6)
Part IX Electron Guns
1049(160)
Chapter 43 General Features of Electron Guns
1051(12)
43.1 Thermionic Electron Guns
1052(5)
43.2 Schottky Emission Guns
1057(1)
43.3 Cold Field Electron Emission Guns
1057(3)
43.4 Beam Transport Systems
1060(3)
Chapter 44 Theory of Electron Emission
1063(20)
44.1 General Relations
1063(2)
44.2 Transmission Through a Plane Barrier
1065(2)
44.3 Thermionic Electron Emission
1067(4)
44.4 The Tunnel Effect
1071(3)
44.5 Field Electron Emission
1074(5)
44.6 Schottky Emission
1079(1)
44.7 Concluding Remarks
1080(3)
Chapter 45 Pointed Cathodes Without Space Charge
1083(18)
45.1 The Spherical Cathode
1083(2)
45.2 The Diode Approximation
1085(4)
45.3 Field Calculation in Electron Sources with Pointed Cathodes
1089(5)
45.3.1 Analytic Field Models
1090(3)
45.3.2 Rigorous Methods
1093(1)
45.4 Simple Models
1094(7)
45.4.1 A Diode-Field Model
1094(2)
45.4.2 Thermionic Triode Guns
1096(5)
Chapter 46 Space Charge Effects
1101(30)
46.1 The Spherical Diode
1101(4)
46.2 Asymptotic Properties and Generalizations
1105(6)
46.3 Determination of the Space Charge
1111(7)
46.4 The Boersch Effect
1118(13)
46.4.1 Introduction
1118(1)
46.4.2 The Shift of the Mean Energy
1119(1)
46.4.3 Thermodynamic Considerations
1119(8)
46.4.4 Analytical Calculations
1127(4)
Chapter 47 Brightness
1131(26)
47.1 Application of Liouville's Theorem
1132(2)
47.2 The Maximum Brightness
1134(3)
47.3 The Influence of Apertures
1137(3)
47.4 Lenz's Brightness Theory
1140(10)
47.4.1 Rotationally Symmetric Electrostatic Fields
1140(5)
47.4.2 The Generalized Theory
1145(5)
47.5 Measurement of the Brightness
1150(2)
47.6 Coulomb Interactions and Brightness
1152(1)
47.7 Aberrations in the Theory of Brightness
1152(5)
Chapter 48 Emittance
1157(14)
48.1 Trace Space and Hyperemittance
1157(2)
48.2 Two-Dimensional Emittances
1159(4)
48.2.1 General Emittance Ellipses
1160(2)
48.2.2 Acceptance and Matching
1162(1)
48.3 Brightness and Emittance
1163(2)
48.4 Emittance Diagrams
1165(6)
Chapter 49 Gun Optics
1171(16)
49.1 The Fujita---Shimoyama Theory
1171(7)
49.2 Rose's Theory
1178(3)
49.3 Matching the Paraxial Approximation to a Cathode Surface
1181(6)
Chapter 50 Complete Electron Guns
1187(22)
50.1 Justification of the Point Source Model
1187(2)
50.2 The Lens System in Field-Emission Devices
1189(6)
50.3 Hybrid Emission
1195(3)
50.4 Conventional Thermionic Guns
1198(3)
50.5 Pierce Guns
1201(2)
50.6 Multi-electron-beam Systems
1203(3)
50.7 Carbon Nanotube Emitters
1206(1)
50.8 Further Reading
1207(2)
Part X Systems with a Curved Optic Axis
1209(88)
Chapter 51 General Curvilinear Systems
1211(28)
51.1 Introduction of a Curvilinear Coordinate System
1212(2)
51.2 Series Expansion of the Potentials and Fields
1214(3)
51.3 Variational Principle and Trajectory Equations
1217(3)
51.4 Simplifying Symmetries
1220(3)
51.5 Trajectory Equations for Symmetric Configurations
1223(2)
51.6 Aberration Theory
1225(14)
51.6.1 Magnetic Systems
1225(3)
51.6.2 Compound Systems
1228(11)
Chapter 52 Sector Fields and Their Applications
1239(42)
52.1 Introduction
1239(1)
52.2 Magnetic Devices with a Circular Optic Axis
1240(3)
52.3 Radial (Horizontal) Focusing for a Particular Model Field
1243(3)
52.4 The Linear Dispersion
1246(2)
52.5 The Axial (Vertical) Focusing
1248(2)
52.6 Fringing Field Effects
1250(7)
52.7 Aberration Theory: The Homogeneous Magnetic Field (n = 0)
1257(2)
52.8 Optimization Procedures
1259(4)
52.8.1 Single Deflection Prisms
1260(2)
52.8.2 Use of Symmetries
1262(1)
52.9 Energy Analysers and Monochromators
1263(18)
52.9.1 Introduction
1263(1)
52.9.2 In-column Energy Analysers
1263(3)
52.9.3 Details of the Various Filters
1266(4)
52.9.4 The Mollenstedt and Ichinokawa Analysers
1270(1)
52.9.5 Postcolumn Spectrometers
1271(1)
52.9.6 Monochromators
1272(9)
Chapter 53 Unified Theories of Ion Optical Systems
1281(16)
53.1 Introduction
1281(1)
53.2 Electrostatic Prisms
1281(4)
53.3 A Unified Version of the Theory
1285(11)
53.4 The Literature of Ion Optics
1296(1)
Notes and References 1297(152)
Index 1449
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics. Erwin Kasper studied physics at the Universities of Münster and Tübingen (Germany), where he obtained his PhD in 1965 and the habilitation to teach physics in 1969. After scientific spells in the University of Tucson, Arizona (1966) and in Munich (1970), he resumed his research and teaching in the Institute of Applied Physics, University of Tübingen, where he was later appointed professor. He lectured on general physics and especially on electron optics. The subject of his research was theoretical electron optics and related numerical methods on which he published numerous papers. After his retirement in 1997, he published a book on numerical field calculation (2001).